The electrical properties of Metal-Ferroelectric (PbZr0.53Ti0.47O3)-Insulator-Silicon (MFIS) capacitors with different insulator materials

被引:9
作者
Juan, PC [1 ]
Hu, YP
Chiu, FC
Lee, JYM
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu, Taiwan
[2] Natl Tsing Hua Univ, Inst Elect Engn, Hsinchu, Taiwan
关键词
MFIS; memory window; SCLC; Poole-Frenkel emission;
D O I
10.1016/j.mee.2005.04.020
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 [电气工程]; 0809 [电子科学与技术];
摘要
MFIS capacitors with Pb(Zr-0.53,Ti-0.47)O-3 (PZT) ferroelectric layer and HfO2, La2O3 and Dy2O3 insulator layers were fabricated and characterized. The size of the capacitance-voltage (C-V) memory windows was investigated. The maximum memory windows of MFIS capacitors with La2O3 and Dy2O3 insulators are close to the theoretical value Delta W approximate to 2d(f)E(c) approximate to 1.8 V. The temperature dependence of the current conduction mechanisms through the MFIS capacitors was also investigated. In the temperature range of 375-450K, the electrical conduction of MFIS capacitors with WO, and Dy2O3 insulators is space-charge-limited current (SCLC), whereas for Al/PZT/La2O3/Si capacitor Poole-Frenkel emission was the dominant mechanism at higher fields (>= 0.8 MV/cm) in the temperature range from 325K to 400K.
引用
收藏
页码:309 / 312
页数:4
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