Rare-earth scandate single- and multi-layer thin films as alternative gate oxides for microelectronic applications

被引:28
作者
Heeg, T [1 ]
Wagner, M
Schubert, J
Buchal, C
Boese, M
Luysberg, M
Cicerrella, E
Freeouf, JL
机构
[1] ISGI IT, Inst Schichten & Grenzflachen, D-52425 Julich, Germany
[2] CNI, Forschungszentrum Julich, D-52425 Julich, Germany
[3] IFF, Forschungszentrum Julich, Ernst Ruska Centru Mikroskopie & Spektroskopie E, D-52425 Julich, Germany
关键词
scandates; titanates; GdSCO3; LaScO3; DySCO3; BaTiO3; PLD; multi-layers; laminates;
D O I
10.1016/j.mee.2005.04.058
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Thin films of rare-earth scandates (REScO3) as well as multi-layers of scandates and titanates have been prepared using pulsed laser deposition. Epitaxial films were grown on SrRuO3/SrTiO3(100) as well as amorphous films on silicon substrates. The epitaxial films are investigated to measure the physical properties of the crystalline material. Electrical measurements (CV, leakage current) show for example high epsilon(r) > 20 for the scandates and epsilon(r) > 35 for the epitaxial and amorphous multi-layer films. A diffusion of the new materials into silicon is not observed.
引用
收藏
页码:150 / 153
页数:4
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