Modified surface charge spectroscopy for the characterization of insulator/semiconductor structures

被引:17
作者
Chan, RWM [1 ]
Kwok, RWM [1 ]
Lau, WM [1 ]
机构
[1] UNIV WESTERN ONTARIO,DEPT MAT ENGN,LONDON,ON N6A 5B7,CANADA
关键词
D O I
10.1063/1.361190
中图分类号
O59 [应用物理学];
学科分类号
摘要
In the present study, a modified charge neutralizer was used to: generate both the negative and positive surface potentials at the dielectric surface for the surface charge spectroscopy (SCS). A stable surface potential and a uniform potential area can be easily achieved. The SCS results of plasma enhanced chemical vapor deposition SiO2/Si samples without annealing and thermal SiO2/Si samples with and without annealing in forming gas (4%H-2 in N-2) are used to demonstrate the applicability of the SCS analysis. (C) 1995 American Institute of Physics.
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页码:3635 / 3639
页数:5
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