Surface-directed deposition of platinum nanostructures on graphite by chemical vapor deposition

被引:20
作者
Aktary, M [1 ]
Lee, CE [1 ]
Xing, Y [1 ]
Bergens, SH [1 ]
McDermott, MT [1 ]
机构
[1] Univ Alberta, Dept Chem, Edmonton, AB T6G 2G2, Canada
关键词
D O I
10.1021/la991303d
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Nanoscale Pt structures were prepared on highly ordered pyrolytic graphite (HOPG) by chemical vapor deposition. The organometallic compound Pt(COD)(CH3)(2) (1) (COD is 1,5-cyclooctadiene) was reduced by hydrogen gas to effect the deposition of Pt. The deposited Pt was characterized by cyclic voltammetry and by tapping mode scanning force microscopy. Tt was found that Pt initially nucleates at, defect sites on HOPG. These nucleated sites then catalyze the hydrogenation of 1 to further deposit Pt adatoms. At low coverages, we observe substrate defect decoration by "nanobead" type structures. Structures that emanate from defect sites onto the basal plane form at higher coverages.
引用
收藏
页码:5837 / 5840
页数:4
相关论文
共 30 条
[1]   Morphological and compositional evolution of Pt-Si intermetallic thin films prepared by the activated adsorption of SiH4 on Pt(111) [J].
Bondos, JC ;
Gewirth, AA ;
Nuzzo, RG .
JOURNAL OF PHYSICAL CHEMISTRY B, 1999, 103 (16) :3099-3109
[2]   VOLATILE METALLOORGANIC PRECURSORS FOR DEPOSITING INORGANIC ELECTRONIC MATERIALS [J].
BRADLEY, DC .
POLYHEDRON, 1994, 13 (08) :1111-1121
[3]   THE PHOTOLYTIC LASER CHEMICAL VAPOR-DEPOSITION RATE OF PLATINUM, ITS DEPENDENCE ON WAVELENGTH, PRECURSOR VAPOR-PRESSURE, LIGHT-INTENSITY, AND LASER-BEAM DIAMETER [J].
BRAICHOTTE, D ;
GARRIDO, C ;
VANDENBERGH, H .
APPLIED SURFACE SCIENCE, 1990, 46 (1-4) :9-18
[4]   SCANNING TUNNELING MICROSCOPY STUDIES OF CARBON OXYGEN REACTIONS ON HIGHLY ORIENTED PYROLYTIC-GRAPHITE [J].
CHANG, HP ;
BARD, AJ .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1991, 113 (15) :5588-5596
[5]   OBSERVATION AND CHARACTERIZATION BY SCANNING TUNNELING MICROSCOPY OF STRUCTURES GENERATED BY CLEAVING HIGHLY ORIENTED PYROLYTIC-GRAPHITE [J].
CHANG, HP ;
BARD, AJ .
LANGMUIR, 1991, 7 (06) :1143-1153
[6]   CHEMICAL VAPOR-DEPOSITION OF PLATINUM - NEW PRECURSORS AND THEIR PROPERTIES [J].
DRYDEN, NH ;
KUMAR, R ;
OU, E ;
RASHIDI, M ;
ROY, S ;
NORTON, PR ;
PUDDEPHATT, RJ ;
SCOTT, JD .
CHEMISTRY OF MATERIALS, 1991, 3 (04) :677-685
[7]   Developing the self-contained hydrogen reference electrode [J].
Gong, SL ;
Lu, JT ;
Yan, HQ .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1997, 436 (1-2) :291-293
[8]   Self-organization processes of InGaAs/GaAs quantum dots grown by metalorganic chemical vapor deposition [J].
Heinrichsdorff, F ;
Krost, A ;
Grundmann, M ;
Bimberg, D ;
Kosogov, A ;
Werner, P .
APPLIED PHYSICS LETTERS, 1996, 68 (23) :3284-3286
[9]   Atomic force microscopy study of the initial growth of copper films by chemical vapor deposition from hexafluoroacetylacetonate-copper(I)-trimethylvinylsilane: An indication of a surface electron transfer reaction [J].
Hong, LS ;
Lin, MZ .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (6A) :L711-L713
[10]   PATTERNED SELF-ASSEMBLED MONOLAYERS FORMED BY MICROCONTACT PRINTING DIRECT SELECTIVE METALIZATION BY CHEMICAL-VAPOR-DEPOSITION ON PLANAR AND NONPLANAR SUBSTRATES [J].
JEON, NL ;
NUZZO, RG ;
XIA, YN ;
MRKSICH, M ;
WHITESIDES, GM .
LANGMUIR, 1995, 11 (08) :3024-3026