Application of scanning probe methods for electronic and magnetic device fabrication, characterization, and testing

被引:8
作者
Born, A
Hahn, C
Lohndorf, M
Wadas, A
Witt, C
Wiesendanger, R
机构
[1] UNIV HAMBURG,INST PHYS APPL,D-20355 HAMBURG,GERMANY
[2] UNIV HAMBURG,CTR MICROSTRUCT RES,D-20355 HAMBURG,GERMANY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期
关键词
D O I
10.1116/1.588738
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Selected examples of the application of scanning probe methods for the fabrication, characterization, and testing of electronic and magnetic devices are presented. In particular, promising combinations of conventional photolithography or e-beam lithography with scanning probe methods are described. The combination of atomic-scale self-organization processes with scanning probe microscopy and manipulation experiments possibly can lead to a novel class of atomic-scale devices which could be fabricated on a reasonable time scale. (C) 1996 American Vacuum Society.
引用
收藏
页码:3625 / 3631
页数:7
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