CHARGE STORAGE IN A NITRIDE-OXIDE-SILICON MEDIUM BY SCANNING CAPACITANCE MICROSCOPY

被引:216
作者
BARRETT, RC
QUATE, CF
机构
[1] Department of Applied Physics, Stanford University, Stanford
关键词
D O I
10.1063/1.349388
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper we describe a variant of the scanning capacitance microscope (SCaM) which is based on the atomic force microscope. Our SCaM involves a cantilever beam that is used to press a conducting tip against a conducting substrate coated with a dielectric film. A capacitance sensor is then used to measure the tip-sample capacitance as a function of lateral position. The deflection of the cantilever can also be used to measure independently the surface topography. This microscope can be used to measure electrical properties of dielectric films and their underlying substrates. We have applied this microscope to the study of the nitride-oxide-silicon (NOS) system. This system has been studied extensively because of its ability to store information by trapping charge in the silicon nitride. Commercial semiconductor nonvolatile memories have been designed using this NOS technology. We have used the SCaM tip to apply a localized bias to the NOS sample, causing charge to tunnel through the oxide layer and to be trapped in the nitride film. This trapped charge induces a depletion region in the silicon substrate, which can be detected by the resulting depletion capacitance between the tip and sample. The stored charge can be interpreted as a digital memory. Bit sizes as small as 750 angstrom full width at half maximum have been stored using this technique. The stored charge has been observed to be stable over a period of seven days. The stored charge can be removed by applying a reverse bias to the region, and the bit can be subsequently rewritten. By simultaneously measuring capacitance and topography images, we have demonstrated that the stored information is not the result of any topographic change to the surface. Simulations of the potential distributions resulting from this trapped charge have been performed and are compared with the experiments. Finally, a discussion is presented on the ultimate density and speed limits of such a storage technology.
引用
收藏
页码:2725 / 2733
页数:9
相关论文
共 17 条
[1]   SURFACE MODIFICATION WITH THE SCANNING TUNNELING MICROSCOPE [J].
ABRAHAM, DW ;
MAMIN, HJ ;
GANZ, E ;
CLARKE, J .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1986, 30 (05) :492-499
[2]   IMPROVED ATOMIC FORCE MICROSCOPE IMAGES USING MICROCANTILEVERS WITH SHARP TIPS [J].
AKAMINE, S ;
BARRETT, RC ;
QUATE, CF .
APPLIED PHYSICS LETTERS, 1990, 57 (03) :316-318
[3]   IMAGING POLISHED SAPPHIRE WITH ATOMIC FORCE MICROSCOPY [J].
BARRETT, RC ;
QUATE, CF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1990, 8 (01) :400-402
[4]   HIGH-SPEED, LARGE-SCALE IMAGING WITH THE ATOMIC FORCE MICROSCOPE [J].
BARRETT, RC ;
QUATE, CF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :302-306
[5]   NONVOLATILE SEMICONDUCTOR MEMORY DEVICES [J].
CHANG, JJ .
PROCEEDINGS OF THE IEEE, 1976, 64 (07) :1039-1059
[6]  
CRICCHI JR, 1972, ISSCC, P98
[7]  
Eaton S. S., 1988, 1988 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. 31st ISSCC. First Edition, P130
[8]   POSITIONING SINGLE ATOMS WITH A SCANNING TUNNELING MICROSCOPE [J].
EIGLER, DM ;
SCHWEIZER, EK .
NATURE, 1990, 344 (6266) :524-526
[9]   EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING [J].
HU, SM ;
KERR, DR ;
GREGOR, LV .
APPLIED PHYSICS LETTERS, 1967, 10 (03) :97-&
[10]   ROTATING MNOS DISK MEMORY DEVICE [J].
IWAMURA, S ;
NISHIDA, Y ;
HASHIMOTO, K .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (07) :854-860