Energetics of surface atomic processes near a lattice step

被引:32
作者
Fu, TY [1 ]
Wu, HT [1 ]
Tsong, TT [1 ]
机构
[1] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
来源
PHYSICAL REVIEW B | 1998年 / 58卷 / 04期
关键词
D O I
10.1103/PhysRevB.58.2340
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An atomic step of a solid surface can act as not only a reflective or nonreflective boundary but also as an atom-trapping boundary. Using the field ion microscope, we have probed in detail the behavior of Ir adatoms at and near the steps of Ir(001) and Ir(lll) surfaces. Activation barrier heights of various atomic processes at step boundaries and the atom-trapping strengths of step-edge sites have been measured. These two surfaces exhibit entirely different step properties. At the terrace near the steps of Ir(lll), an empty zone of adatom occupation is found the width of which depends on the terrace size. The difference in the reflective barrier heights of A-type and B-type step edges of Ir(lll) layers is also derived.
引用
收藏
页码:2340 / 2346
页数:7
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