Electrical characterisation of phosphorus-doped ZnO thin films grown by pulsed laser deposition

被引:20
作者
Doggett, B. [1 ]
Chakrabarti, S. [1 ]
O'Haire, R. [1 ]
Meaney, A. [1 ]
McGlynn, E. [1 ]
Henry, M. O. [1 ]
Mosnier, J. P. [1 ]
机构
[1] Dublin City Univ, Natl Ctr Plasma Sci & Technol, Sch Phys Sci, Dublin 9, Ireland
基金
爱尔兰科学基金会;
关键词
ZnO; phosphorus-doped ZnO; p-type doping ZnO; pulsed laser deposition; hall effect;
D O I
10.1016/j.spmi.2007.04.028
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Phosphorus-doped ZnO films were grown by pulsed laser deposition using a ZnO:P2O5-doped target as the phosphorus source with the aim of producing p-type ZnO material. ZnO:P layers (with phosphorus concentrations of between 0.01 to 1 wt%) were grown on a pure ZnO buffer layer. The electrical properties of the films were characterised from temperature dependent Hall-effect measurements. The samples typically showed weak n-type conduction in the dark, with a resistivity of 70 Omega cm, a Hall mobility of mu(n) similar to 0.5 cm(2) V-1 s(-1) and a carrier concentration of n similar to 3 x 10(17) cm(-3) at room temperature. After exposure to an incandescent light source, the samples underwent a change in conduction from n- to p-type, with an increase in mobility and decrease in concentration for temperatures below 300 K. (c) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码:74 / 78
页数:5
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