Fabrication, of nanostructured superconducting single-photon detectors

被引:76
作者
Gol'tsman, GN [1 ]
Smirnov, K
Kouminov, P
Voronov, B
Kaurova, N
Drakinsky, V
Zhang, J
Verevkin, A
Sobolewski, R
机构
[1] Moscow State Pedag Univ, Dept Phys, Moscow 119435, Russia
[2] Univ Rochester, Dept Elect & Comp Engn, Rochester, NY 14627 USA
[3] Univ Rochester, Laser Energet Lab, Rochester, NY 14627 USA
[4] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
关键词
electron-beam lithography; reactive ion etching; single-photon detection; superconducting ultrathin NbN films;
D O I
10.1109/TASC.2003.813678
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Fabrication of NbN superconducting single-photon detectors, based on the hotspot effect is presented. The hotspot formation arises in an ultrathin and submicrometer-width superconductor stripe and, together with the supercurrent redistribution, leads to the resistive detector response upon absorption of a photon. The detector has a meander structure to maximally increase its active area and reach the highest detection efficiency. Main processing steps, leading to efficient devices, sensitive in 0.4-5 mum wavelength range, are presented. The impact of various processing steps on the performance and operational parameters of our detectors is discussed.
引用
收藏
页码:192 / 195
页数:4
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