Photoemission study of CF4 rf-Plasma treated multi-wall carbon nanotubes

被引：25

作者：

Felten, A. ^{[2
]}

Ghijsen, J. ^{[2
]}

Pireaux, J. -J. ^{[2
]}

Johnson, R. L. ^{[3
]}

Whelan, C. M. ^{[4
]}

Liang, D. ^{[5
]}

Van Tendeloo, G. ^{[5
]}

Bittencourt, Carla ^{[1
]}

机构：

[1] Univ Mons, LCIA, B-7000 Mons, Belgium

[2] Univ Namur, LISE, B-5000 Namur, Belgium

[3] U Hamburg, Inst Expt Phys, D-22761 Hamburg, Germany

[4] IMEC, B-3001 Heverlee, Belgium

[5] Univ Antwerp, EMAT, B-2020 Antwerp, Belgium

来源：

CARBON | 2008年 / 46卷 / 10期

关键词：

D O I：

10.1016/j.carbon.2008.04.027

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Multi-wall carbon nanotubes (MWCNTs) were exposed to a CF4 rf-plasma. X-ray photoelectron spectroscopy analysis shows that the treatment effectively grafts fluorine atoms onto the MWCNTs. The fluorine atomic concentration and the nature of the C-F bond (semi-ionic or covalent) can be tuned by varying the exposure time. Ultraviolet photoelectron spectroscopy analysis confirms that the valence electronic states are altered by the grafting of fluorine atoms. Characterization with high-resolution transmission electron microscopy reveals that while the plasma treatment does not induce significant etching impact on the CNT-surface, it does increase the number of active sites for gold cluster formation. (C) 2008 Elsevier Ltd. All rights reserved.

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页码：1271 / 1275

页数：5

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