Preparation of Cu(In,Ga)Se2 thin films at low substrate temperatures

被引:47
作者
Nishiwaki, S
Satoh, T
Hashimoto, Y
Negami, T
Wada, T
机构
[1] Matsushita Elect Ind Co Ltd, Adv Technol Res Labs, Kyoto 6190237, Japan
[2] Ryukoku Univ, Dept Chem Mat, Otsu, Shiga 5202194, Japan
关键词
D O I
10.1557/JMR.2001.0059
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cu(In,Ga)Se-2(CIGS) thin films were prepared at substrate temperatures of 350 to 500 degreesC. The (In,Ga),Se, precursor layers were deposited on Mo coated soda-lime glass and then exposed to Cu and Se fluxes to form CIGS films. The surface composition was probed by a real-time composition monitoring method. The CIGS films were characterized by x-ray diffraction, energy dispersive x-ray spectroscopy, secondary ion mass spectroscopy, and atomic force microscopy. The transient formation of a Cu-Se phase with a high thermal emissivity was observed during the deposition of Cu and Se at a substrate temperature of 350 degreesC. Faster diffusion of In than Ga from the (In,Ga),Se, precursor to the newly formed CIGS layer was observed. A growth model for CIGS films during the deposition of Cu and Se onto (In,Ga)(2)Se-3 precursor is proposed. A solar cell using a CIGS film prepared at about 350 degreesC showed an efficiency of 12.4%.
引用
收藏
页码:394 / 399
页数:6
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