Simulation of plasma molding over a ring on a flat surface

被引:15
作者
Kim, D [1 ]
Economou, DJ [1 ]
机构
[1] Univ Houston, Dept Chem Engn, Plasma Proc Lab, Houston, TX 77204 USA
关键词
D O I
10.1063/1.1602573
中图分类号
O59 [应用物理学];
学科分类号
摘要
A fluid/Monte Carlo simulation model was developed to study plasma molding over an axisymmetric feature (a ring) resting on an otherwise planar surface in contact with a high-density rf plasma. The two-dimensional (rz) time-dependent sheath potential, and ion density and flux profiles were predicted with a self-consistent fluid simulation. The trajectories of ions and energetic neutrals (resulting mainly by ion neutralization on the cylindrical sidewalls of the ring) were then followed with a Monte Carlo simulation, in an effort to obtain their energy and angular distributions on the substrate surface. When the sheath thickness was comparable to the size of the ring, strong radial electric fields deflected oncoming ions toward the sidewalls of the ring. The ion density was lower in the cylindrical well formed by the ring, compared to outside, resulting in a locally thicker sheath and a smaller spread in the double-peaked ion energy distributions at the bottom of the well. The ion impact angle increased progressively as the sidewalls were approached. The angular distribution of energetic (fast) neutrals at the bottom of the well was bimodal. The energy distribution of fast neutrals at the bottom of the well was broader compared to the parent ion energy distributions. (C) 2003 American Institute of Physics.
引用
收藏
页码:3740 / 3747
页数:8
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