共 17 条
[1]
Energy distribution of ions bombarding biased electrodes in high density plasma reactors
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1999, 17 (02)
:506-516
[2]
Emery A, 1968, J COMPUT PHYS, V2, P306, DOI [10.1016/0021-9991(68)90060-0, DOI 10.1016/0021-9991(68)90060-0]
[3]
Molecular dynamics simulations of Ar+ and Cl+ impacts onto silicon surfaces:: Distributions of reflected energies and angles
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1998, 16 (06)
:3502-3514
[6]
KIM D, IN PRESS IEEE T PLAS
[8]
Dynamics of collisionless rf plasma sheaths
[J].
JOURNAL OF APPLIED PHYSICS,
1997, 82 (08)
:3689-3709
[10]
Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
2001, 19 (02)
:398-404