Plasma molding over surface topography

被引:2
作者
Kim, D [1 ]
Economou, DJ [1 ]
机构
[1] Univ Houston, Plasma Proc Lab, Dept Chem Engn, Houston, TX 77204 USA
关键词
plasma molding; sheath evolution; ion energy and angular distributions; Monte Carlo method; plasma etching;
D O I
10.1299/jsmeb.45.117
中图分类号
O414.1 [热力学];
学科分类号
摘要
A two-dimensional fluid/Monte Carlo simulation model was developed to study plasma "molding" over surface topography. The plasma sheath evolution and potential distribution over the surface were predicted with a self consistent fluid simulation. The trajectories of ions and energetic neutrals were then followed with a Monte Carlo simulation. In this paper, energy and angular distributions of ions and energetic neutrals bombarding an otherwise planar target with a step are reported. As one approaches the step, the ion flux decreases and the ion impact angle increases drastically. For a time invariant sheath (DC case), the ion energy distributions (IED) remain relatively unaffected. When the plasma sheath oscillates at radio frequencies, the IED narrows, while the ion angular distribution becomes broader as one approaches the step. The energetic neutral flux is found to be significant near the vertical step wall. The simulation results are in good agreement with experimental data.
引用
收藏
页码:117 / 122
页数:6
相关论文
共 24 条
[1]   ION KINETICS IN LOW-PRESSURE, ELECTROPOSITIVE, RF GLOW-DISCHARGE SHEATHS [J].
BARNES, MS ;
FORSTER, JC ;
KELLER, JH .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) :240-244
[2]   PARTICLE-IN-CELL CHARGED-PARTICLE SIMULATIONS, PLUS MONTE-CARLO COLLISIONS WITH NEUTRAL ATOMS, PIC-MCC [J].
BIRDSALL, CK .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) :65-85
[3]   A MONTE-CARLO ANALYSIS OF AN ELECTRON SWARM IN A NONUNIFORM FIELD - THE CATHODE REGION OF A GLOW-DISCHARGE IN HELIUM [J].
BOEUF, JP ;
MARODE, E .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1982, 15 (11) :2169-2187
[4]   Plasma sheath electric field strengths above a grooved electrode in a parallel-plate radio-frequency discharge [J].
Czarnetzki, U ;
Hebner, GA ;
Luggenhölscher, D ;
Döbele, HF ;
Riley, ME .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (01) :70-71
[5]   Modeling and simulation of plasma etching reactors for microelectronics [J].
Economou, DJ .
THIN SOLID FILMS, 2000, 365 (02) :348-367
[6]   Energy distribution of ions bombarding biased electrodes in high density plasma reactors [J].
Edelberg, EA ;
Perry, A ;
Benjamin, N ;
Aydil, ES .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (02) :506-516
[7]   Metastable chlorine ion kinetics in inductively coupled plasmas [J].
Hebner, GA ;
Fleddermann, CB ;
Miller, PA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (05) :2698-2708
[8]  
Hirschfelder J. O., 1954, MOL THEORY GASES LIQ
[9]   2-DIMENSIONAL FLUID MODELING OF TIME-DEPENDENT PLASMA SHEATH [J].
HONG, MP ;
EMMERT, GA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02) :889-896
[10]   ION-BOMBARDMENT ENERGY-DISTRIBUTIONS IN A RADIO-FREQUENCY INDUCTION PLASMA [J].
HOPWOOD, J .
APPLIED PHYSICS LETTERS, 1993, 62 (09) :940-942