ION KINETICS IN LOW-PRESSURE, ELECTROPOSITIVE, RF GLOW-DISCHARGE SHEATHS

被引：60

作者：

BARNES, MS

FORSTER, JC

KELLER, JH

机构：

[1] IBM East Fishkill, NY, 12533-0999, Route 52, B/300, Z/48A, Hopewell Junction

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1991年 / 19卷 / 02期

关键词：

D O I：

10.1109/27.106819

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Ion kinetics in low-pressure (e.g., 1 mtorr), electropositive, RF glow discharge sheaths are studied using a Monte Carlo-based computer simulation. The numerical model integrates particle trajectories using a spatially nonlinear, time-varying model of the electric field in the RF sheath. A scaling relationship is then discussed, relating the normalized ion energy spread to the ratio of ion sheath transit time to the RF period. The scaled numerical data shows good agreement with existing numerical and experimental data.

引用

页码：240 / 244

页数：5

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