Spatially resolved EELS fine structures at a SiO2/TiO2 interface

被引:28
作者
Brun, N
Colliex, C
Rivory, J
YuZhang, K
机构
[1] UNIV PARIS 06,OPT SOLIDES LAB,CNRS,URA 781,F-75252 PARIS 05,FRANCE
[2] UNIV MARNE VALLEE,LAB RECONNAISSANCE MAT ENVIRONM,F-93166 NOISY LE GRAND,FRANCE
来源
MICROSCOPY MICROANALYSIS MICROSTRUCTURES | 1996年 / 7卷 / 03期
关键词
D O I
10.1051/mmm:1996112
中图分类号
TH742 [显微镜];
学科分类号
摘要
SiO2/TiO2 multilayers stacks used in optical coatings have been studied by Electron Energy Loss Spectroscopy (EELS). The line-spectrum mode has been used: the incident electron probe of the STEM is scanned under digital control on the specimen surface in the direction perpendicular to the layers, while the whole spectrum is acquired. The selected energy range contains Ti L(23) and O K edges, in order to study the evolution of the fine structures visible on these edges. Every experimental spectrum is then fitted with a linear combination of the two reference spectra (TiO2 and SiO2) extracted from the same sequence. It is possible to identify in the neighbourhood of the interface some EELS fine structures which cannot be fitted to a combination of reference spectra, but are representative of hybrid environments, such as Si-O-Ti in the present study. A quantitative analysis of the changes in different fine structures on the titanium and oxygen edges enables to clearly discriminate different levels of interdiffusion at the boundary.
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页码:161 / 174
页数:14
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