Fabrication of four-probe fine electrodes using scanning-probe nanofabrication

被引：11

作者：

Akai, T

Abe, T

Shimomura, T

Kato, M

Ishibashi, M

Heike, S

Choi, BK

Hashizume, T

Ito, K

机构：

[1] Univ Tokyo, Grad Sch Frontier Sci, Dept Adv Mat Sci, Bunkyo Ku, Tokyo 1138656, Japan

[2] Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 7B期

关键词：

scanning-probe lithography; nanofabrication; atomic force microscopy; reactive ion beam etching; carbon nanotube;

D O I：

10.1143/JJAP.42.4764

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have fabricated four-probe Pt electrodes on a sapphire substrate by,scanning-probe nanofabrication and reactive ion beam etching. Surface roughness, gap width and height of the fabricated electrodes were 0.3 nm, 150 nm and 4 to 5 run, respectively. In order to test the quality of the fine electrodes, we evaluated the current through a multi-walled carbon nanotube (MWNT) placed on the electrodes. The measured two-probe resistance of the MWNT was 130 kOmega which included the contact resistance, while the leakage resistance was larger than I TOmega.

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收藏

页码：4764 / 4766

页数：3

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