Combining atomic force microscopic lithography with photolithography

被引：17

作者：

Ishibashi, M ^{[1
]}

Heike, S ^{[1
]}

Hashizume, T ^{[1
]}

机构：

[1] Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 12B期

关键词：

AFM; SPM; nanolithography; photolithography;

D O I：

10.1143/JJAP.39.7060

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We developed a method that combines atomic force microscopic (AFM) lithography with photolithography. This method uses small-step structures on the resist surface, fabricated by slight development, to align the patterns produced by photolithography and AFM lithography. We used this hybrid method to fabricate nan ow wire patterns that led to large contact-pad patterns and demonstrated it's effectiveness at reducing drawing time and lengths.

引用

页码：7060 / 7062

页数：3

共 6 条

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[2]

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