LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE

被引：158

作者：

MCCORD, MA

PEASE, RFW

机构：

[1] Stanford Solid State Electronics, Lab, Stanford, CA, USA, Stanford Solid State Electronics Lab, Stanford, CA, USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583400

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：86 / 88

页数：3

共 9 条

[1] BINNIG G, 1982, HELV PHYS ACTA, V55, P55
[2] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES
BROERS, AN
MOLZEN, WW
CUOMO, JJ
WITTELS, ND
[J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598
[3] HIGH-RESOLUTION, LOW-VOLTAGE PROBES FROM A FIELD-EMISSION SOURCE CLOSE TO THE TARGET PLANE
MCCORD, MA
PEASE, RFW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 198 - 201
[4] AIF3 - A NEW VERY HIGH-RESOLUTION ELECTRON-BEAM RESIST
MURAY, A
ISAACSON, M
ADESIDA, I
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (05) : 589 - 591
[5] POLASKO KJ, 1983, P SOC PHOTO-OPT INST, V393, P27, DOI 10.1117/12.935090
[6] POMERANTZ M, 1980, PHASE TRANSITION S, P317
[7] NANOMETER LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE
RINGGER, M
HIDBER, HR
SCHLOGL, R
OELHAFEN, P
GUNTHERODT, HJ
[J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 832 - 834
[8] GENERATION AND APPLICATIONS OF FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS
YAU, YW
PEASE, RFW
IRANMANESH, AA
POLASKO, KJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1048 - 1052
[9] TOPOGRAFINER - INSTRUMENT FOR MEASURING SURFACE MICROTOPOGRAPHY
YOUNG, R
WARD, J
SCIRE, F
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1972, 43 (07) : 999 - &