Surface work function studies in porous silicon

被引:14
作者
Bhave, TM [1 ]
Bhoraskar, SV [1 ]
机构
[1] Univ Poona, Dept Phys, Poona 411007, Maharashtra, India
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 04期
关键词
D O I
10.1116/1.590129
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Band structure studies in porous silicon provide useful information about the operative phenomenon responsible for its room temperature photoluminescence. We have measured the average surface work function, using a retarding field diode method in ultrahigh vacuum conditions, for porous silicon having different crystalline columnar dimensions. The average crystallite size was determined by grazing angle x-ray diffraction measurements; whereas the band gap was estimated from the photoluminescence measurements. Based on these results, different empirical band structural models are reviewed. Photoconductivity measurements in porous silicon also insinuate that the electrical resistivity of the surface of porous silicon is manipulated by the silicon complexes present on the surface. It has been concluded that, in addition to the quantum confinement, the surface molecular species dominantly control the behavior of photoluminescence and average surface work function of porous silicon. (C) 1998 American Vacuum Society.
引用
收藏
页码:2073 / 2078
页数:6
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