Chemical vapor deposition of iridium, platinum, rhodium and palladium

被引:109
作者
Garcia, JRV [1 ]
Goto, T [1 ]
机构
[1] Tohoku Univ, Mat Res Inst, Sendai, Miyagi 9808577, Japan
关键词
chemical vapor deposition; noble metals; platinum group metals; metal organic complex;
D O I
10.2320/matertrans.44.1717
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.
引用
收藏
页码:1717 / 1728
页数:12
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