High wear durability of ECR-sputtered carbon films

被引：20

作者：

Hirono, S

Umemura, S

Andoh, Y

Hayashi, T

Kaneko, R

机构：

[1] NTT Corp, Integrated Informat & Energy Syst Labs, Musashino, Tokyo 180, Japan

[2] Wakayama Univ, Wakayama 640, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1998年 / 34卷 / 04期

关键词：

D O I：

10.1109/20.706686

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We investigated the effect of ion irradiation on the wear of carbon films prepared by electron-cyclotron-resonance plasma (ECR) sputtering. The wear durability of the ECR-sputtered films was far superior to that of the RF-sputtered films. ECR- sputtered films made with a high energy ion irradiation showed the highest wear resistance, nearly equal to that of bulk diamond. We attribute this high durability to selective etching;of the weakly bonded carbon atoms by the high-energy ion irradiation.

引用

页码：1729 / 1731

页数：3

共 7 条

[1] ANALYSIS OF ELASTIC AND PLASTIC-DEFORMATION ASSOCIATED WITH INDENTATION TESTING OF THIN-FILMS ON SUBSTRATES [J].