Control of CuO particle size on SiO2 by spin coating

被引:93
作者
Brookshier, MA [1 ]
Chusuei, CC [1 ]
Goodman, DW [1 ]
机构
[1] Texas A&M Univ, Dept Chem, College Stn, TX 77842 USA
关键词
D O I
10.1021/la981325k
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to study the size and distribution of nanometer-sized metallic particles of four Cu/SiO2 model catalyst systems. The systems were constructed by spin coating copper(II) acetate [Cu(CH3CO2)(2). H2O, Cu(ac)(2)] solutions of varying concentration (0.0040, 0.0070, 0.0085, and 0.010 M) onto polished Si(100) substrates with an 5-10 nm SiO2 oxide overlayer. Homogeneously distributed, nanometer-sized CuO particles were formed by calcinating the samples to 450 degrees C for 4 h. Narrow particle size distributions were observed for each system, with mean particle size increasing with increasing concentration. The ability to control mean particle size to the order of 1 nn was successfully demonstrated over this concentration range.
引用
收藏
页码:2043 / 2046
页数:4
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