Metal plasma immersion ion implantation and deposition (MPIIID): chromium on magnesium

被引：26

作者：

Bruckner, J ^{[1
]}

Gunzel, R ^{[1
]}

Richter, E ^{[1
]}

Moller, W ^{[1
]}

机构：

[1] Rossendorf Inc, Forschungszentrum Rossendorf EV, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1998年 / 104卷

关键词：

metal plasma immersion ion implantation and deposition; chromium; magnesium;

D O I：

10.1016/S0257-8972(98)00399-5

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Chromium films have been deposited on magnesium by metal plasma immersion ion implantation and deposition. With this method an intermixed layer can be produced by ion implantation before film deposition. The most suitable process parameters for implantation have been determined. The plasma is produced by a cathodic are discharge operated in direct current mode and filtered by means of a curved magnetic filter. The maximum total ion current available at the filter exit is about 1.45% of the are current for chromium. This corresponds to a filter transmission of about 24%. The dependence of the particle content of the films on the substrate position has been investigated. The corrosion behavior of the coated magnesium is improved greatly by reducing the particle content of the film as well as by the formation of an intermixed layer. (C) 1998 Elsevier Science S.A.

引用

页码：227 / 230

页数：4

共 10 条

[1]

AKSENOV II, 1978, SOV J PLASMA PHYS, V4, P425

[2] EFFECT OF DUCT BIAS ON TRANSPORT OF VACUUM-ARC PLASMAS THROUGH CURVED MAGNETIC FILTERS [J].