Surface-states effects on GaAs FET electrical performance

被引:21
作者
Ohno, Y [1 ]
Francis, P [1 ]
Nogome, M [1 ]
Takahashi, Y [1 ]
机构
[1] NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Ibaraki, Osaka 305, Japan
关键词
charge carrier processes; FET's; interface phenomena; semiconductor device modeling; semiconductor-insulator interfaces;
D O I
10.1109/16.737461
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We analyzed the effects of surface-states on GaAs FET electrical performance with a two-dimensional (2-D) device simulator that used a surface-state model based on Shockley-Read-Hall (SRH) statistics. We found that under typical FET operating conditions, electron-trap-type surface-states pin the surface potential to the electron quasi-Fermi level (that is, the n-type channel potential), whereas hole-trap-type surface-states pin it to the hole quasi-Fermi level (that is, the gate potential). This difference affects both the electric-field distribution along the channel, and the drain current values. The transient responses to step-bias application at the gate and at the drain showed slow transients due to the surface-states, but the directions of the shifts were opposite for the different trap-types. We explain these phenomena using a theory based on Shockley-Read-Hall statistics for the surface-states.
引用
收藏
页码:214 / 219
页数:6
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