Pit formation during graphene synthesis on SiC(0001):: In situ electron microscopy

被引:146
作者
Hannon, J. B. [1 ]
Tromp, R. M. [1 ]
机构
[1] IBM Corp, Div Res, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
来源
PHYSICAL REVIEW B | 2008年 / 77卷 / 24期
关键词
D O I
10.1103/PhysRevB.77.241404
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have studied the formation of graphene on the Si face of SiC(0001)-6H and -4H using in situ electron microscopy. By imaging the nucleation and growth of the 6 root 3 "buffer layer" during annealing in vacuum we identify key factors responsible for the appearance of deep pits during graphene formation. Pits form because domains of the buffer layer pin decomposing surface steps. Graphene is observed to nucleate in the pits, where the step density is high.
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页数:4
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