共 8 条
Optimization of magnetoresistive sensitivity in electrodeposited FeCoNi/Cu multilayers
被引:13
作者:
Gong, J
[1
]
Butler, WH
Zangari, G
机构:
[1] Univ Alabama, Mat Sci Program, Tuscaloosa, AL 35487 USA
[2] Univ Alabama, MINT Ctr, Tuscaloosa, AL 35487 USA
[3] Univ Virginia, CESE, Charlottesville, VA 22904 USA
基金:
美国国家科学基金会;
关键词:
electrodeposition;
FeCoNi/Cu;
magnetic multilayers;
magnetoresistive sensitivity;
D O I:
10.1109/TMAG.2005.855170
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Giant magnetoresistive (GMR) multilayers with high GMR sensitivity might find application in low-end magnetic sensors. Electrodeposition of FeCoNi/Cu GMR multilayers directly onto n-type silicon was carried out from a single electrolyte and their magnetotransport properties were investigated. Inhomogeneous dissolution of the ferromagnetic (FM) layer during Cu sublayer deposition has an important role in determining the shape of the GMR characteristics; lower dissolution promotes sharper interfaces and larger slopes of the GMR versus field curve at low fields. An increase of the Fe content in the FM sublayers reduces coercivity but promotes selective dissolution and degrades interface sharpness. Electrodeposition conditions are optimized to achieve a maximum GMR of 9% saturated at < 0.5 kOe, and a maximum GMR sensitivity of over 0.11%/Oe in the field range 5-15 Oe with a saturation GMR of 6.1%.
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页码:3634 / 3636
页数:3
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