Identification of surface anion antisite defects in (110) surfaces of III-V semiconductors

被引:11
作者
Ebert, P
Quadbeck, P
Urban, K
Henninger, B
Horn, K
Schwarz, G
Neugebauer, J
Scheffler, M
机构
[1] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany
[2] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
关键词
D O I
10.1063/1.1408906
中图分类号
O59 [应用物理学];
学科分类号
摘要
We identify surface anion antisite defects in (110) surfaces of GaAs, GaP, and InP using scanning tunneling microscopy combined with density-functional theory calculations. In contrast to subsurface arsenic antisite defects, surface antisite defects are electrically inactive and have a very localized defect state which gives rise to a distinct feature in scanning tunneling microscopy images. (C) 2001 American Institute of Physics.
引用
收藏
页码:2877 / 2879
页数:3
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