Morphological study on an Azobenzene-containing liquid crystalline Diblock copolymer

被引:17
作者
Ding, Liming [1 ]
Mao, Huiming [1 ]
Xu, Ji [1 ]
He, Jinbo [1 ]
Ding, Xuan [1 ]
Russell, Thomas P. [1 ]
Robello, Douglas R. [2 ]
Mis, Mark [2 ]
机构
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] Eastman Kodak Co, Res Labs, Rochester, NY 14650 USA
关键词
D O I
10.1021/ma702625c
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The block copolymers containing azobenzene undergo an efficient photoisomerization under irradiation and this photoresponsive property makes Azo block copolymers potentially useful for many applications, including photoswitches, photoinduced patterning, and many more. The Iyoda et al. first synthesized an amphiphilic liquid crystalline diblock copolymer containing PEO as the hydrophilic block and a polymethacrylate with Azo side chains as the hydrophobic, liquid crystalline, and photoactive block. The diblock copolymer exhibited only 1 percent weight loss up to 316°C, demonstrating good thermal stability. The melting point of diblock copolymer at the PEO block decreased to 39.7°C, consistent with the presence of the Azo block. The rigid-rod like Azo units easily pack uniformly and can propagate this order over large distances, but when the temperature goes below the PEO melting point the PEO block crystallizes between the hard Azo microdomain.
引用
收藏
页码:1897 / 1900
页数:4
相关论文
共 47 条
[1]   BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT [J].
BATES, FS ;
FREDRICKSON, GH .
ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) :525-557
[2]   Block copolymers - Designer soft materials [J].
Bates, FS ;
Fredrickson, GH .
PHYSICS TODAY, 1999, 52 (02) :32-38
[3]   Blends of poly(methacrylate) block copolymers with photoaddressable segments [J].
Breiner, Thomas ;
Kreger, Klaus ;
Hagen, Rainer ;
Haeckel, Michael ;
Kador, Lothar ;
Mueller, Axel H. E. ;
Kramer, Edward J. ;
Schmidt, Hans-Werner .
MACROMOLECULES, 2007, 40 (06) :2100-2108
[4]   Self-assembled smectic phases in rod-coil block copolymers [J].
Chen, JT ;
Thomas, EL ;
Ober, CK ;
Mao, GP .
SCIENCE, 1996, 273 (5273) :343-346
[5]   Templated self-assembly of block copolymers: Top-down helps bottom-up [J].
Cheng, Joy Y. ;
Ross, Caroline A. ;
Smith, Henry I. ;
Thomas, Edwin L. .
ADVANCED MATERIALS, 2006, 18 (19) :2505-2521
[6]   Pattern registration between spherical block-copolymer domains and topographical templates [J].
Cheng, JY ;
Zhang, F ;
Smith, HI ;
Vancso, GJ ;
Ross, CA .
ADVANCED MATERIALS, 2006, 18 (05) :597-+
[7]   Fabrication of nanostructures with long-range order using block copolymer lithography [J].
Cheng, JY ;
Ross, CA ;
Thomas, EL ;
Smith, HI ;
Vancso, GJ .
APPLIED PHYSICS LETTERS, 2002, 81 (19) :3657-3659
[8]   Three-dimensional self-assembly of spherical block copolymer domains into V-shaped grooves [J].
Chuang, Vivian P. ;
Cheng, Joy Y. ;
Savas, Tim A. ;
Ross, Caroline A. .
NANO LETTERS, 2006, 6 (10) :2332-2337
[9]   Synthesis of azobenzene-containing diblock copolymers using atom transfer radical polymerization and the photoalignment behavior [J].
Cui, L ;
Zhao, Y ;
Yavrian, A ;
Galstian, T .
MACROMOLECULES, 2003, 36 (22) :8246-8252
[10]   Block copolymer thin films: Physics and applications [J].
Fasolka, MJ ;
Mayes, AM .
ANNUAL REVIEW OF MATERIALS RESEARCH, 2001, 31 :323-355