Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films

被引：8

作者：

Jia, H ^{[1
]}

Veldeman, J ^{[1
]}

Burgelman, M ^{[1
]}

机构：

[1] State Univ Ghent, Dept Elect & Informat Syst, B-9000 Ghent, Belgium

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 193卷 / 1-3期

关键词：

magnetron sputtering; helium; uniformity; longitudinal magnetic thin alms; ion bombardment;

D O I：

10.1016/S0304-8853(98)00415-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of diluting the argon sputter gas with helium in DC-magnetron sputtering of both CoCr magnetic layers and Cr underlayers was studied. A Co88Cr12 target and a PET substrate were used. The addition of helium markedly improved the longitudinal magnetic properties and the magnetic uniformity of the films. It is shown that sputtering of the Cr underlayer with a He/Ar mixture improved the magnetic properties of the CoCr film which was sputtered subsequently; an explanation is that the structure of the Cr him sputtered with He/Ar is better suited to the epitaxial growth of CoCr. The beneficial effects of He are ascribed to an increased ion bombardment on the substrate. This is supported by measurement of the ion current of the substrate and by SEM measurements. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：124 / 127

页数：4

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