Mechanistic and Computational Studies of Oxidatively-Induced Aryl-CF3 Bond-Formation at Pd: Rational Design of Room Temperature Aryl Trifluoromethylation
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作者:
Ball, Nicholas D.
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Univ Michigan, Dept Chem, Ann Arbor, MI 48109 USAUniv Michigan, Dept Chem, Ann Arbor, MI 48109 USA
Ball, Nicholas D.
[1
]
Gary, J. Brannon
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Univ Michigan, Dept Chem, Ann Arbor, MI 48109 USAUniv Michigan, Dept Chem, Ann Arbor, MI 48109 USA
Gary, J. Brannon
[1
]
Ye, Yingda
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Univ Michigan, Dept Chem, Ann Arbor, MI 48109 USAUniv Michigan, Dept Chem, Ann Arbor, MI 48109 USA
Ye, Yingda
[1
]
Sanford, Melanie S.
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Univ Michigan, Dept Chem, Ann Arbor, MI 48109 USAUniv Michigan, Dept Chem, Ann Arbor, MI 48109 USA
Sanford, Melanie S.
[1
]
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[1] Univ Michigan, Dept Chem, Ann Arbor, MI 48109 USA
This article describes the rational design of first generation systems for oxidatively induced Aryl-CF3 bond-forming reductive elimination from Pd-II. Treatment of (dtbpy)Pd-II(Aryl)(CF3) (dtbpy = di-tert-butylbipyridine) with NFTPT (N-fluoro-1,3,5-trimethylpyridinium triflate) afforded the isolable Pd-IV interrnediate (dtbpy)Pd-IV(Aryl)(CF3)(F)-(OTf). Thermolysis of this complex at 80 degrees C resulted in Aryl-CF3 bond-formation. Detailed experimental and computational mechanistic studies have been conducted to gain insights into the key reductive elimination step. Reductive elimination from this Pd-IV species proceeds via pre-equilibrium dissociation of TfO- followed by Aryl-CF3 coupling. DFT calculations reveal that the transition state for Aryl-CF3 bond formation involves the CF3 acting as an electrophile with the Aryl ligand serving as a nudeophilic coupling partner. These mechanistic considerations along with DFT calculations have facilitated the design of a second generation system utilizing the tmeda (N,N,N',N'-tetramethylethylenediamine) ligand in place of dtbpy. The tmeda complexes undergo oxidative trifluoromethylation at room temperature.
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
Kaspi, Ariela W.
Yahav-Levi, Anette
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
Yahav-Levi, Anette
Goldberg, Israel
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
Goldberg, Israel
Vigalok, Arkadi
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
机构:
Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
Kaspi, Ariela W.
Yahav-Levi, Anette
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Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
Yahav-Levi, Anette
Goldberg, Israel
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机构:
Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel
Goldberg, Israel
Vigalok, Arkadi
论文数: 0引用数: 0
h-index: 0
机构:
Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, IsraelTel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Chem, IL-69978 Tel Aviv, Israel