Monte Carlo simulation of absolute secondary electron yield of Cu

被引:50
作者
Ding, ZJ [1 ]
Li, HM
Tang, XD
Shimizu, R
机构
[1] Univ Sci & Technol China, Struct Res Lab, Hefei 230026, Anhui, Peoples R China
[2] Univ Sci & Technol China, Dept Astron & Appl Phys, Hefei 230026, Anhui, Peoples R China
[3] Osaka Inst Technol, Dept Informat Proc, Osaka 5730196, Japan
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2004年 / 78卷 / 04期
关键词
D O I
10.1007/s00339-002-1994-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A Monte Carlo simulation model of electron interaction with solids that includes cascade secondary electron production has been used to study secondary electron emission from Cu. An optical dielectric function was used to describe electron energy loss and the associated secondary electron excitation. From the simulation, the absolute primary energy dependence of the secondary yield and the energy distribution of secondary electrons has been obtained. We have compared the calculated true secondary yield and total secondary yield curves with experiment. Good agreement has been found only for those experiment data obtained in ultrahigh vacuum.
引用
收藏
页码:585 / 587
页数:3
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