The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering

被引：42

作者：

Arnell, RD ^{[1
]}

Colligon, JS ^{[1
]}

Minnebaev, KF ^{[1
]}

Yurasova, VE ^{[1
]}

机构：

[1] MOSCOW MV LOMONOSOV STATE UNIV,FAC PHYS,MOSCOW 117234,RUSSIA

来源：

VACUUM | 1996年 / 47卷 / 05期

关键词：

D O I：

10.1016/0042-207X(95)00241-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium nitride TiNchi layers with different nitrogen content have been deposited on hard tool steel substrates by unbalanced magnetron sputtering at different nitrogen partial pressures so that the effect of nitrogen content on the structural and mechanical properties of the films could be studied. The film microhardness was found to have a maximum at chi approximate to 0.9. For this value of chi a maximum content of carbon and the highest lattice distortion (especially for the (200) plane) was observed. Chemical bonding between the film components was shown to be the determining factor for the microhardness, as well as intrinsic stress created due to lattice imperfections.

引用

页码：425 / 431

页数：7

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