Fast optimal design of semiconductor devices

被引:29
作者
Burger, M
Pinnau, R
机构
[1] Johannes Kepler Univ Linz, Inst Ind Math, A-4040 Linz, Austria
[2] Tech Univ Darmstadt, Fachbereich Math, D-64289 Darmstadt, Germany
关键词
semiconductor design; drift-diffusion; optimal control; dopant profiling;
D O I
10.1137/S0036139902420560
中图分类号
O29 [应用数学];
学科分类号
070104 ;
摘要
This paper presents a new approach to the design of semiconductor devices, which leads to fast optimization methods whose numerical effort is of the same order as a single forward simulation of the underlying model, the stationary drift-diffusion system. The design goal we investigate is to increase the outflow current on a contact for fixed applied voltage; the natural design variable is the doping profile. By reinterpreting the doping profile as a state variable and the electrostatic potential as the new design variable, we obtain a simpler optimization problem, whose Karush - Kuhn - Tucker conditions partially decouple. This property allows us to construct efficient iterative optimization algorithms, which avoid solving the fully coupled drift-diffusion system, and need only solves of the continuity equations and their adjoints. The efficiency and success of the new approach is demonstrated in several numerical examples.
引用
收藏
页码:108 / 126
页数:19
相关论文
共 24 条
[1]  
[Anonymous], 1997, MATH SURVEYS MONOGRA, DOI DOI 10.1090/SURV/049
[2]  
[Anonymous], 2002, RECENT PROGR COMPUTA
[3]   TWO-DIMENSIONAL EXPONENTIAL FITTING AND APPLICATIONS TO DRIFT-DIFFUSION MODELS [J].
BREZZI, F ;
MARINI, LD ;
PIETRA, P .
SIAM JOURNAL ON NUMERICAL ANALYSIS, 1989, 26 (06) :1342-1355
[4]   Identification of doping profiles in semiconductor devices [J].
Burger, M ;
Engl, HW ;
Markowich, PA ;
Pietra, P .
INVERSE PROBLEMS, 2001, 17 (06) :1765-1795
[5]  
BURGER M, 2002, EXPONENTIAL FITTING
[6]  
CIAMPOLINI L, 2001, THESIS ETH ZURICH
[7]   Characterization of two-dimensional dopant profiles: Status and review [J].
Diebold, AC ;
Kump, MR ;
Kopanski, JJ ;
Seiler, DG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01) :196-201
[8]   IDENTIFIABILITY OF SEMICONDUCTOR DEFECTS FROM LBIC IMAGES [J].
FANG, WF ;
ITO, K .
SIAM JOURNAL ON APPLIED MATHEMATICS, 1992, 52 (06) :1611-1626
[9]   RECONSTRUCTION OF SEMICONDUCTOR DOPING PROFILE FROM LASER-BEAM-INDUCED CURRENT IMAGE [J].
FANG, WF ;
ITO, K .
SIAM JOURNAL ON APPLIED MATHEMATICS, 1994, 54 (04) :1067-1082
[10]   INVERSE PROBLEMS FOR METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR CONTACT RESISTIVITY [J].
FANG, WF ;
CUMBERBATCH, E .
SIAM JOURNAL ON APPLIED MATHEMATICS, 1992, 52 (03) :699-709