Deposition of Teflon-polymer thin films by synchrotron radiation photodecomposition

被引：24

作者：

Katoh, T ^{[1
]}

Zhang, Y ^{[1
]}

机构：

[1] Sumitomo Heavy Ind Ltd, Tanashi, Tokyo 1888585, Japan

来源：

APPLIED SURFACE SCIENCE | 1999年 / 138卷

关键词：

teflon; polymer; thin film; photo-etching; synchrotron; laser ablation;

D O I：

10.1016/S0169-4332(98)00395-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin films of Teflon-polymers such as PTFE (polytetrafluoroethylene), FEP (polytetrafluoroethylene-co-hexafluoro-propylene) and PFA (polytetrafluoroethylene-co-perluoroalkoxy vinyl ether) were deposited on Si(100) substrates by synchrotron radiation (the critical wavelength of 1.5 nm) etching of their corresponding starting materials in vacuo. Analysis of the deposited films has been carried out with X-ray photoelectron spectroscopy (XPS), Fourier transfer infrared (FTIR) spectroscopy as well as X-ray diffraction (XRD) and their surface morphologies were observed under scanning electron microscopy (SEM). For the deposition of the Teflon-polymer films, the processing with the synchrotron radiation photo-etching was compared with that using laser ablation and significant differences between them are discussed. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：165 / 168

页数：4

共 9 条

[1] DEPOSITION OF AMORPHOUS FLUOROPOLYMERS THIN-FILMS BY LASER ABLATION [J].