Developing plating baths for the production of cobalt-molybdenum films

被引:40
作者
Gómez, E [1 ]
Pellicer, E [1 ]
Vallés, E [1 ]
机构
[1] Univ Barcelona, Dept Quim Fis, Electrodep, E-08028 Barcelona, Spain
关键词
cobalt-molybdenum alloy; electrodeposition; white-light interferometry; AFM;
D O I
10.1016/j.surfcoat.2004.09.017
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A set of plating baths for obtaining soft-magnetic cobalt-molybdenum (Co-Mo) films with 5-11 wt.% Mo was tested. Free Co2+ concentration in solution seemed to determine the quality of the electrodeposited films. Coherent, compact Co-Mo films were obtained under a current efficiency up to similar to 70% in baths with similar to 40% free Cot(2+). By contrast, low concentrations of free Co2+ reduced current efficiency in the preparation of the deposits, while excess concentrations of free Co2+ resulted in cracked films. Backscattered electron images demonstrated that good-quality Co-Mo films grew layer by layer. Such growth was linked to both structural and magnetic properties. The coatings presented a crystallographic direction parallel to the substrate. Moreover, a high uniaxial anisotropy constant and an angle of the resulting anisotropy of 62 degrees were determined by magnetic measurements. The selectivity of deposition was verified on photolithographed silicon-based substrates. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:238 / 246
页数:9
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