X-ray fine structure investigation of germanium nanoclusters

被引：5

作者：

Blasing, J ^{[1
]}

Kohlert, P ^{[1
]}

Zacharias, M ^{[1
]}

Veit, P ^{[1
]}

机构：

[1] Otto Von Guericke Univ, Inst Phys Expt, D-39016 Magdeburg, Germany

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1998年 / 31卷

关键词：

D O I：

10.1107/S0021889898001071

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Germanium nanostructures embedded in amorphous SiOx matrices were investigated by different X-ray techniques. We report either randomly distributed or layer-organized arrangements of the nanoclusters or nanocrystals, depending on the sputtering conditions. Recrystallization was found to occur by annealing the films near the melting point of germanium.

引用

页码：589 / 593

页数：5

共 7 条

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