Time-integrated reflectivity of laser-induced back-ablated aluminum thin film targets

被引：19

作者：

Bullock, AB ^{[1
]}

Bolton, PR ^{[1
]}

Mayer, FJ ^{[1
]}

机构：

[1] MAYER APPL RES INC, ANN ARBOR, MI 48103 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1997年 / 82卷 / 04期

关键词：

D O I：

10.1063/1.366289

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A study of the time-integrated reflectivity of Al targets during laser-induced back ablation by 1064 nm, 10 ns laser pulses is reported. The Al target reflectance data is analyzed using a model which includes not only Al surface removal but also the possible production of Al plasma. Calculations based on a sharp Al film ablation fluence (J(th) approximate to 710 mJ/cm(2)) threshold agree with the reflectance data. Plasma reflectance contribution is found to be negligible for plasma electron densities of less than 0.3 critical density. (C) 1997 American Institute of Physics.

引用

页码：1828 / 1831

页数：4

共 13 条

[1]

Baseman R. J., 1988, Fundamentals of Beam-Solid Interactions and Transient Thermal Processing. Symposium, P627

[2] METAL-DEPOSITION FROM A SUPPORTED METAL-FILM USING AN EXCIMER LASER [J].