Electron-beam-induced strain within InGaN quantum wells: False indium "cluster" detection in the transmission electron microscope

被引:229
作者
Smeeton, TM [1 ]
Kappers, MJ [1 ]
Barnard, JS [1 ]
Vickers, ME [1 ]
Humphreys, CJ [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1063/1.1636534
中图分类号
O59 [应用物理学];
学科分类号
摘要
InGaN quantum wells have been found to be extremely sensitive to exposure to the electron beam in the transmission electron microscope (TEM). High-resolution TEM images acquired immediately after first irradiating a region of quantum well indicates no gross fluctuations of indium content in the InGaN alloy. During only a brief period of irradiation, inhomogeneous strain is introduced in the material due to electron beam damage. This strain is very similar to that expected from genuine nanometer-scale indium composition fluctuations which suggests there is the possibility of falsely detecting indium-rich "clusters" in a homogeneous quantum well. (C) 2003 American Institute of Physics.
引用
收藏
页码:5419 / 5421
页数:3
相关论文
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