Bulk and surface contributions to second-order susceptibility in crystalline and porous silicon by second-harmonic generation

被引:44
作者
Falasconi, M
Andreani, LC
Malvezzi, AM
Patrini, M
Mulloni, V
Pavesi, L
机构
[1] Univ Pavia, Dipartimento Fis A Volta, INFM, I-27100 Pavia, Italy
[2] Univ Pavia, Dipartimento Elettron, INFM, I-27100 Pavia, Italy
[3] Univ Trento, Dipartimento Fis, INFM, I-38050 Povo, TN, Italy
关键词
silicon; porous solids; semiconducting surfaces; second harmonic generation; ellipsometry; semi-empirical models and model calculations;
D O I
10.1016/S0039-6028(01)01004-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Accurate second-harmonic generation (SHG) measurements in reflection on native-oxide-covered porous silicon samples and on (1 0 0) p-type doped crystalline silicon wafers have been performed. Non-linear reflection coefficients of both materials have been measured as a function of the azimuthal angle around the direction normal to the surface. An absolute calibration has been performed to allow a quantitative analysis of second-harmonic efficiencies. Following the theory of SHG in reflection in centrosymmetric media, surface and bulk terms of chi ((2)) have been estimated for the crystalline and nano-crystalline materials: linear optical constants of porous Si have been independently determined by spectroscopic ellipsometry. chi ((2)) of porous Si is found to be more than two orders of magnitude smaller than in crystalline Si. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:105 / 112
页数:8
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