Compositional analysis and depth profile studies on undoped and doped tin oxide films prepared by spray technique

被引：97

作者：

Amanullah, FM

Pratap, KJ

Babu, VH

机构：

[1] King Saud Univ, Coll Sci, Dept Phys, Riyadh 11451, Saudi Arabia

[2] Osmania Univ, Coll Engn, Dept Phys, Hyderabad 500007, Andhra Pradesh, India

[3] Osmania Univ, Coll Sci, Dept Phys, Hyderabad 500007, Andhra Pradesh, India

来源：

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1998年 / 52卷 / 2-3期

关键词：

compositional analysis; depth profile studies; tin oxide films;

D O I：

10.1016/S0921-5107(98)00113-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Tin oxide (TO) and fluorine doped tin oxide (FTO) thin films of different thicknesses and varying impurity concentrations have been prepared by spray technique. The XRD results are in good agreement with ASTM data. From the XPS (X-ray photoelectron spectroscopy) studies, the presence of tin and oxygen in tin oxide has been confirmed and also the ratio of Sn/O has been found out. Chemical analysis of FTO films has been carried out by SAM (Scanning Auger Microprobe) studies and from the peak to peak height (PPH) calculations, Sn, O and F concentrations have been determined. The compositional analysis of FTO films at different depths (depth propfiles) has been studied. The results have been explained. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：93 / 98

页数：6

共 22 条

[1] Transmission electron microscopy investigation of tin sub-oxide nucleation upon SnO2 deposition on silicon [J].