Effects of physical treatment of ITO electrodes on the electrical properties of pentacene thin-film transistors

被引:15
作者
Lee, Hwa Sung
Cho, Jeong Ho
Kim, Woong-Kwon
Lee, Jong-Lam
Cho, Kilwon [1 ]
机构
[1] Pohang Univ Sci & Technol, Polymer Res Inst, Dept Chem Engn, Pohang 790784, South Korea
[2] Pohang Univ Sci & Technol, Polymer Res Inst, Dept Mat Sci & Engn, Pohang 790784, South Korea
关键词
D O I
10.1149/1.2746127
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We report that treating indium tin oxide (ITO) source and drain electrodes with ozone or oxygen (O-2) plasma enhances the hole injection from these electrodes to pentacene semiconductor, thereby improving the performance of pentacene thin-film transistors. Synchrotron radiation photoelectron spectroscopy results showed that the ozone and O-2 plasma treatments of the electrodes increased their work functions by about 0.4 and 1.0 eV, respectively, compared to the as-deposited ITO electrode. These increases in work function were found to lower the hole injection barrier, producing remarkable increases in the field-effect mobility.
引用
收藏
页码:H239 / H242
页数:4
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