Preparation of ZnO thin films on various substrates by pulsed laser deposition

The structural and optical properties of ZnO thin films deposited on Si (10 0), silica glass, alpha-Al2O3 (0 0 0 1) and Corning 7059 glass substrates by pulsed laser deposition have been studied. We have investigated the dependence of film properties on deposition conditions such as an ambient oxygen gas pressure (P-O2) and a substrate temperature (T-s). XRD, AFM and photoluminescence (PL) measurements were used to characterize the grown films. The ZnO thin films deposited on various substrates under optimized condition of P-O2 = 0.67 Pa and T-s = 550 degreesC were highly c-axis (0 0 2) orientated. The ZnO thin film deposited on alpha-Al2O3, (0 0 0 1) substrate under optimal condition emitted ultra-violet PL at approximately 395 nm by optically pumped excitation (355 nm) at a power of 466 kW/cm(2). (C) 2003 Elsevier Science B.V. All rights reserved.