Nanomechanical Properties of Prepared-TiO2 Films Using Nanoindentation Technique

被引:6
作者
Chuang, Li-Chin [1 ]
Luo, Chin-Hsiang [1 ]
机构
[1] Hungkuang Univ, Dept Safety Hlth & Environm Engn, Taichung 43302, Taiwan
来源
ADVANCES IN KEY ENGINEERING MATERIALS | 2011年 / 214卷
关键词
Young's modulus; Hardness; Nanoindentation; TiO2; TIO2; FILMS; THIN-FILMS; HARDNESS; POWDERS;
D O I
10.4028/www.scientific.net/AMR.214.388
中图分类号
T [工业技术];
学科分类号
120111 [工业工程];
摘要
Nanoindentation was used to measure the hardness and Young's modulus of prepared-TiO2 films. The thickness and refractive index of the TiO2 films were measured using ellipsometry with a monochromator. Scanning electron microscopy was used to determine the micrography of the TiO2 films. Pure TiO2 films were prepared from sols made by 3 % (w/w) of prepared-TiO2 suspension solution coated onto silicon wafers. After the dip-coating was completed, the coatings were further treated by various procedures. natural air-drying, water-vapor exposure, and calcinations. The prepared-TiO2 films were smooth and free of macro cracking. The grain sizes of these films were uniform and in the range of 50-100 rim and the films were of rutile structure. The prepared-TiO2 coatings exhibited more favorable porosity in water-vapor exposure than those under other conditions. The T-(H2SO4) coatings exhibited higher hardness and modulus than those with T-(H2O) and T-(NH4OH) coatings after high temperature calcination. The values of hardness and modulus for T-(H2SO4) coatings were 11.93 GPa and 226.25 GPa, respectively. Curves of hardness and modulus as a function of depth (0-2200 nm) of the coatings under calcination conditions show a peak at shallow contact depth within 100 rim and then demonstrate being rather constant. The hardness and modulus curve obtained from T-(H2SO4) coatings in water-vapor exposure are rather constant.
引用
收藏
页码:388 / 391
页数:4
相关论文
共 14 条
[1]
CHEN YJ, 2006, J MOL CATAL A-CHEM, V244, P255
[2]
TiO2 and TiO2-SiO2 thin films and powders by one-step soft-solution method:: Synthesis and characterizations [J].
Ennaoui, A ;
Sankapal, BR ;
Skryshevsky, V ;
Lux-Steiner, MC .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2006, 90 (10) :1533-1541
[3]
ELECTRONIC-PROPERTIES OF THE INTERFACE BETWEEN SI AND TIO2 DEPOSITED AT VERY LOW-TEMPERATURES [J].
FUYUKI, T ;
MATSUNAMI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (09) :1288-1291
[4]
Photoredox properties of ultrafine rutile TiO2 acicular powder in aqueous 4-chlorophenol, Cu-EDTA and Pb-EDTA solutions [J].
Kim, SJ ;
Lee, HG ;
Kim, SJ ;
Lee, JK ;
Lee, EG .
APPLIED CATALYSIS A-GENERAL, 2003, 242 (01) :89-99
[5]
Lee KR, 2002, J AM CERAM SOC, V85, P341
[6]
NUCLEATION AND GROWTH IN TIO2 FILMS PREPARED BY SPUTTERING AND EVAPORATION [J].
LOBL, P ;
HUPPERTZ, M ;
MERGEL, D .
THIN SOLID FILMS, 1994, 251 (01) :72-79
[7]
Titanium oxide thin films for NH3 monitoring: Structural and physical characterizations [J].
Manno, D ;
Micocci, G ;
Rella, R ;
Serra, A ;
Taurino, A ;
Tepore, A .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (01) :54-59
[8]
Fabrication of multifunctional coating which combines low-e property and visible-light-responsive photocatalytic activity [J].
Okada, M ;
Yamada, Y ;
Jin, P ;
Tazawa, M ;
Yoshimura, K .
THIN SOLID FILMS, 2003, 442 (1-2) :217-221
[9]
AN IMPROVED TECHNIQUE FOR DETERMINING HARDNESS AND ELASTIC-MODULUS USING LOAD AND DISPLACEMENT SENSING INDENTATION EXPERIMENTS [J].
OLIVER, WC ;
PHARR, GM .
JOURNAL OF MATERIALS RESEARCH, 1992, 7 (06) :1564-1583
[10]
HARDNESS, ADHESION AND ABRASION RESISTANCE OF TIO2 FILMS ON GLASS [J].
PERRY, AJ ;
PULKER, HK .
THIN SOLID FILMS, 1985, 124 (3-4) :323-333