The production of the new cubic FeN phase by reactive magnetron sputtering

被引：33

作者：

Rissanen, L

Schaaf, P

Neubauer, M

Lieb, KP

Keinonen, J

Sajavaara, T

机构：

[1] Univ Gottingen, Inst Phys 2, D-37073 Gottingen, Germany

[2] Univ Helsinki, Accelerator Lab, FIN-00014 Helsinki, Finland

来源：

APPLIED SURFACE SCIENCE | 1999年 / 138卷

关键词：

FeN; films;

D O I：

10.1016/S0169-4332(98)00404-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

FeN(y) films with a nitrogen content of nearly 50 at.% (y approximate to 1) were prepared by reactive magnetron sputtering. Their properties were studied as a function of several sputtering parameters (gas-flow rates, substrate temperature and bias voltage), using ion-beam analytical methods, Mossbauer spectroscopy as well as transmission electron microscopy (TEM) and X-ray diffraction (XRD). In order to highlight the role of light contaminant elements (H,C,O) in the production of single-phase cubic FeN films, the concentration profiles of all the elements of the films were measured by Time of Flight Elastic Recoil Detection Analysis (TOF-ERDA). (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：261 / 265

页数：5

共 15 条

[1] SIMULTANEOUS TRIPLE RADIATION MOSSBAUER-SPECTROSCOPY (STRMS) [J].

GONSER, U ;

SCHAAF, P ;

AUBERTIN, F .

HYPERFINE INTERACTIONS, 1991, 66 (1-4) :95-100

[2]

JACOBS H, 1995, J ALLOY COMPD, V99, P1

[3] Comparison of TOF-ERDA and nuclear resonance reaction techniques for range profile measurements of keV energy implants [J].

Jokinen, J ;

Keinonen, J ;

Tikkanen, P ;

Kuronen, A ;

Ahlgren, T ;

Nordlund, K .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 119 (04) :533-542

[4] Characterization of magnetron-sputtered chromium and iron nitride films [J].

Kacsich, T ;

Niederdrenk, M ;

Schaaf, P ;

Lieb, KP ;

Geyer, U ;

Schulte, O .

SURFACE & COATINGS TECHNOLOGY, 1997, 93 (01) :32-36

[5] Characterization of TiN films prepared by a conventional magnetron sputtering system: Influence of nitrogen flow percentage and electrical properties [J].

Kawamura, M ;

Abe, Y ;

Yanagisawa, H ;

Sasaki, K .

THIN SOLID FILMS, 1996, 287 (1-2) :115-119

[6] A LEAST SQUARE FIT PROGRAM [J].

KUNDIG, W .

NUCLEAR INSTRUMENTS & METHODS, 1969, 75 (02) :336-&

[7] FE-57 MOSSBAUER STUDY OF FENX(X=0.25-0.91) ALLOYS [J].

NAKAGAWA, H ;

NASU, S ;

FUJII, H ;

TAKAHASHI, M ;

KANAMARU, F .

HYPERFINE INTERACTIONS, 1991, 69 (1-4) :455-458

[8]

Rissanen L, 1996, ITAL PHY SO, V50, P595

[9]

RISSANEN L, IN PRESS J ALL COMP

[10] CHARACTERIZATION OF LASER-NITRIDED IRON AND SPUTTERED IRON NITRIDE FILMS [J].

SCHAAF, P ;

ILLGNER, C ;

NIEDERDRENK, M ;

LIEB, KP .

HYPERFINE INTERACTIONS, 1995, 95 (1-4) :199-225

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