Monitoring and modifying properties of metal surfaces by electronic surface states

被引：112

作者：

Memmel, N

机构：

[1] MPI Plasmaphys, Div Surface Sci, D-85740 Garching, Germany

[2] Univ Innsbruck, Inst Phys Chem, A-6020 Innsbruck, Austria

来源：

SURFACE SCIENCE REPORTS | 1998年 / 32卷 / 3-4期

关键词：

D O I：

10.1016/S0167-5729(98)00006-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The wave functions of electronic surface states are localized near the surface of solids. Therefore surface states are well suited to monitor the physical and chemical state of the surface. If surface states are (partially) occupied, they contribute to the charge density near the surface and to the total energy of the system. Thus they modify the properties of the surface. The influence is particularly pronounced for processes occurring far in front of the surface, where the charge density caused by "competing" bulk states is low or in cases where the total energy differences are only small. Examples from various fields of surface physics are given where metal surface states can be used to monitor and modify surface properties.

引用

页码：91 / 163

页数：73

共 159 条

[11] Tailoring surface electronic properties to promote chemical reactivity [J].