Nanostructured gradient-index antireflection diffractive optics

被引:65
作者
Chang, Chih-Hao [1 ]
Dominguez-Gaballero, Jose A. [1 ]
Choi, Hyungryul J. [1 ]
Barbastathis, George [1 ,2 ]
机构
[1] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
[2] Singapore MIT Alliance Res & Technol SMART Ctr, Singapore, Singapore
关键词
BROAD-BAND; LITHOGRAPHY; GRATINGS; COUPLER;
D O I
10.1364/OL.36.002354
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We describe the fabrication and characterization of a nanostructured diffractive element with near-zero reflection losses. In this element, subwavelength nanostructures emulating adiabatic index matching are integrated on the surface of a diffractive microstructure to suppress reflected diffraction orders. The fabricated silicon grating exhibits reflected efficiencies that are suppressed by 2 orders of magnitude over broad wavelength bands and wide incident angles. Theoretical models of the fabricated structure based on rigorous coupled-wave analysis and effective medium theory are in agreement with the experimental data. The proposed principles can be applied to improve the performance of any diffractive structures, potentially leading to more efficient Fresnel lenses, holographic elements, and integrated optical systems. (C) 2011 Optical Society of America
引用
收藏
页码:2354 / 2356
页数:3
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