Characteristics of carbon nitride films prepared by magnetic filtered plasma stream

被引:41
作者
Wei, AX [1 ]
Chen, DH
Ke, N
Peng, SQ
Wong, SP
机构
[1] Zhongshan Univ, Dept Phys, Guangzhou, Peoples R China
[2] Chinese Univ Hong Kong, Dept Elect Engn, Shatin, Hong Kong
关键词
nitrides; diamond; Fourier transform infrared spectroscopy; X-ray photoelectron spectroscopy;
D O I
10.1016/S0040-6090(97)01036-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nitride films have been formed using a magnetic field filtered plasma stream deposition system. The electrical, optical and mechanical properties of these films deposited at different N-2 partial pressures have been studied. infrared spectra exhibit characteristic bands of carbon nitrogen bonds at 2200, 1500, 1350 cm(-1), showing that the C and N atoms are chemically bonded in the films. X-ray photoelectron spectroscopy has been employed to measure the atomic ratio of N to C in the films. By deconvolution of the XPS spectra, it was identified that the films consist of three phases, namely, beta-C3N4, CNx and ta-C. The relative fractions of these phases in the films were also determined. The optical band gap obtained from optical absorption spectra varies from 3.85 to 4.51 eV depending on the N-2 partial pressure. The measured value of Vickers hardness H-v is between 4000 and 7000 kg/mm(2). The effect of N-2 partial pressure on the properties of these films is also discussed. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:217 / 221
页数:5
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