High magnetoresistive sensitivity in electrodeposited FeCoNi/Cu multilayers

被引:20
作者
Gong, J [1 ]
Butler, WH
Zangari, G
机构
[1] Univ Alabama, Mat Sci Program, Tuscaloosa, AL 35487 USA
[2] Univ Alabama, Ctr Mat Informat Technol, Tuscaloosa, AL 35487 USA
[3] Univ Virginia, Charlottesville, VA 22904 USA
关键词
D O I
10.1063/1.1952573
中图分类号
O59 [应用物理学];
学科分类号
摘要
FeCoNi/ Cu multilayers with large magnetoresistive sensitivity at low field have been electrodeposited on n-type Si from a single electrolyte by modulating the deposition potential. Dissolution of the ferromagnetic (FM) layer during copper deposition was minimized and interface sharpness was improved by monitoring the current transients during the transition from FM to Cu deposition and using these data to fine tune the Cu deposition potential and Fe2+ concentration in the electrolyte. Using optimal processing parameters, a maximum giant magnetoresistance (GMR) ratio above 9% could be obtained. Maximum GMR sensitivity of over 0.11%/Oe was achieved in the field range 5-15 Oe. (c) 2005 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 20 条
[1]   Decomposition of the magnetoresistance of multilayers into ferromagnetic and superparamagnetic contributions -: art. no. 054427 [J].
Bakonyi, I ;
Péter, L ;
Rolik, Z ;
Kiss-Szabó, K ;
Kupay, Z ;
Tóth, J ;
Kiss, LF ;
Pádár, J .
PHYSICAL REVIEW B, 2004, 70 (05) :054427-1
[2]   Origin of giant magnetoresistance contributions in electrodeposited Ni-Cu/Cu multilayers [J].
Bakonyi, I ;
Tóth, J ;
Kiss, LF ;
Tóth-Kádár, E ;
Péter, L ;
Dinia, A .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2004, 269 (02) :156-167
[3]  
CHANG JW, 1994, P 3 INT S MAGN MAT P, P223
[4]   GMR applications [J].
Daughton, JM .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1999, 192 (02) :334-342
[5]   ELECTRONIC TRANSPORT-PROPERTIES AND THICKNESS DEPENDENCE OF THE GIANT MAGNETORESISTANCE IN CO/CU MULTILAYERS [J].
ECKL, T ;
REISS, G ;
BRUCKL, AH ;
HOFFMANN, H .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (01) :362-367
[6]   GIANT MAGNETORESISTANCE PEAKS IN CONICU/CU MULTILAYERS GROWN BY ELECTRODEPOSITION [J].
HUA, SZ ;
LASHMORE, DS ;
SALAMANCARIBA, L ;
SCHWARZACHER, W ;
SWARTZENRUBER, LJ ;
MCMICHAEL, RD ;
BENNETT, LH ;
HART, R .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (10) :6519-6521
[7]   Electrodeposition of FeCoNiCu/Cu compositionally modulated multilayers [J].
Huang, Q ;
Young, DP ;
Chan, JY ;
Jiang, J ;
Podlaha, EJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (06) :C349-C354
[8]   GIANT MAGNETORESISTANCE IN SOFT-MAGNETIC NIFECO/CU MULTILAYERS [J].
JIMBO, M ;
TSUNASHIMA, S ;
KANDA, T ;
GOTO, S ;
UCHIYAMA, S .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (05) :3341-3344
[9]   Giant magnetoresistance in electrodeposited Co87Fe13/Cu compositionally modulated alloys [J].
Kakuno, EM ;
da Silva, RC ;
Mattoso, N ;
Schreiner, WH ;
Mosca, DH ;
Teixeira, SR .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1999, 32 (11) :1209-1213
[10]   Comparison of the structure and magnetotransport properties of Co-Ni-Cu/Cu multilayers electrodeposited on n-GaAs(001) and (111) [J].
Kasyutich, OI ;
Schwarzacher, W ;
Fedosyuk, VM ;
Laskarzhevskiy, PA ;
Masliy, AI .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (08) :2964-2968