High magnetoresistive sensitivity in electrodeposited FeCoNi/Cu multilayers

被引:20
作者
Gong, J [1 ]
Butler, WH
Zangari, G
机构
[1] Univ Alabama, Mat Sci Program, Tuscaloosa, AL 35487 USA
[2] Univ Alabama, Ctr Mat Informat Technol, Tuscaloosa, AL 35487 USA
[3] Univ Virginia, Charlottesville, VA 22904 USA
关键词
D O I
10.1063/1.1952573
中图分类号
O59 [应用物理学];
学科分类号
摘要
FeCoNi/ Cu multilayers with large magnetoresistive sensitivity at low field have been electrodeposited on n-type Si from a single electrolyte by modulating the deposition potential. Dissolution of the ferromagnetic (FM) layer during copper deposition was minimized and interface sharpness was improved by monitoring the current transients during the transition from FM to Cu deposition and using these data to fine tune the Cu deposition potential and Fe2+ concentration in the electrolyte. Using optimal processing parameters, a maximum giant magnetoresistance (GMR) ratio above 9% could be obtained. Maximum GMR sensitivity of over 0.11%/Oe was achieved in the field range 5-15 Oe. (c) 2005 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 20 条
[11]   The role of nucleation in the evolution of giant magneto resistance with layer thicknesses in electrodeposited Co-Cu/Cu multilayers [J].
Liu, QX ;
Péter, L ;
Tóth, J ;
Kiss, LF ;
Cziráki, A ;
Bakonyi, I .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2004, 280 (01) :60-74
[12]   Structural and magnetic characterization of electrodeposited, high moment FeCoNi films [J].
Liu, XM ;
Zangari, G ;
Shamsuzzoha, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (03) :C159-C168
[13]   Co-Ni-Cu/Cu multilayers electrodeposited using a channel flow cell [J].
Nabiyouni, G ;
Kasyutich, OI ;
Roy, S ;
Schwarzacher, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (04) :C218-C222
[14]   Giant magnetoresistance in multilayers electrodeposited on n-Si [J].
O'Keeffe, AP ;
Kasyutich, OI ;
Schwarzacher, W ;
de Oliveira, LS ;
Pasa, AA .
APPLIED PHYSICS LETTERS, 1998, 73 (07) :1002-1004
[15]   Electrochemical deposition of metals onto silicon [J].
Oskam, G ;
Long, JG ;
Natarajan, A ;
Searson, PC .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (16) :1927-1949
[16]  
PARKIN SSP, 1993, NATO ADV SCI INST SE, V309, P113
[17]   Giant magnetoresistance in electrodeposited films [J].
Schwarzacher, W ;
Lashmore, DS .
IEEE TRANSACTIONS ON MAGNETICS, 1996, 32 (04) :3133-3153
[18]  
SHINJO T, 1993, NATO ADV SCI INST SE, V309, P323
[19]   Magnetoresistance effect of Co/Cu multilayer film produced by electrodeposition method [J].
Ueda, Y ;
Hataya, N ;
Zaman, H .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1996, 156 (1-3) :350-352
[20]   Giant magnetoresistance in Co-Cu/Cu multilayers prepared by various electrodeposition control modes [J].
Weihnacht, V ;
Péter, L ;
Tóth, J ;
Pádár, J ;
Kerner, Z ;
Schneider, CM ;
Bakonyi, I .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (08) :C507-C515