A physical-based analytical turn-on model of polysilicon thin-film transistors for circuit simulation

被引:52
作者
Yang, GY [1 ]
Hur, SH
Han, CH
机构
[1] Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea
[2] Samsung Elect Co Ltd, Kyungki Do, South Korea
关键词
kink effect; polysilicon thin-film transistors; turn-on model;
D O I
10.1109/16.737456
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A physical-based analytical current model of poly-Si thin-film transistors (TFT's) for circuit simulation is presented. The model includes the barrier potential at grain boundaries, drain induced grain barrier lowering (DIGBL), temperature dependence, and the kink effect. The basic equation in the model has an analytic form for implementation in circuit simulators. The model has simple relationships between model parameters and device or material parameters. In addition to the current model, a capacitance model based on the current model is presented. Comparisons between the model and measured results show excellent agreement over wide ranges of operating voltages and for devices with different channel lengths.
引用
收藏
页码:165 / 172
页数:8
相关论文
共 12 条
[1]  
BYUN YH, 1990, SOLID STATE ELECT, V33, P279
[2]  
HACK M, 1990, 22 INT C SOL STAT DE, P999
[3]   HIGH-PERFORMANCE LOW-TEMPERATURE POLYSILICON THIN-FILM-TRANSISTOR USING ECR PLASMA THERMAL OXIDE AS GATE INSULATOR [J].
LEE, JY ;
HAN, CH ;
KIM, CK .
IEEE ELECTRON DEVICE LETTERS, 1994, 15 (08) :301-303
[4]  
Li C. C., 1993, International Electron Devices Meeting 1993. Technical Digest (Cat. No.93CH3361-3), P497, DOI 10.1109/IEDM.1993.347302
[5]   A QUASI-2-DIMENSIONAL ANALYTICAL MODEL FOR THE TURN-ON CHARACTERISTICS OF POLYSILICON THIN-FILM TRANSISTORS [J].
LIN, PS ;
GUO, JY ;
WU, CY .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (03) :666-674
[6]   CHARACTERISTICS AND 3-DIMENSIONAL INTEGRATION OF MOSFETS IN SMALL-GRAIN LPCVD POLYCRYSTALLINE SILICON [J].
MALHI, SDS ;
SHICHIJO, H ;
BANERJEE, SK ;
SUNDARESAN, R ;
ELAHY, M ;
POLLACK, GP ;
RICHARDSON, WF ;
SHAH, AH ;
HITE, LR ;
WOMACK, RH ;
CHATTERJEE, PK ;
LAM, HW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) :258-281
[7]   DEVELOPMENT AND ELECTRICAL-PROPERTIES OF UNDOPED POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS [J].
PROANO, RE ;
MISAGE, RS ;
AST, DG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (09) :1915-1922
[8]   ELECTRICAL PROPERTIES OF POLYCRYSTALLINE SILICON FILMS [J].
SETO, JYW .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (12) :5247-5254
[9]  
SMET HD, 1995, J SID, P119
[10]  
Sze S. M., 1981, PHYSICS SEMICONDUCTO, P367